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00000cam a2200000Ki 4500 |
| 001 |
11081623 |
| 005 |
20170630050314.2 |
| 006 |
m o d |
| 007 |
cr cnu|||unuuu |
| 008 |
131112s2014 nyua ob 001 0 eng d |
| 003 |
ICU |
| 040 |
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|a GW5XE
|b eng
|e rda
|e pn
|c GW5XE
|d N$T
|d IDEBK
|d CDX
|d GGVRL
|d OCLCF
|d OCLCQ
|d NKT
|d YDXCP
|d UWW
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| 020 |
|
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|a 9781461480549
|q (electronic bk.)
|
| 020 |
|
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|a 146148054X
|q (electronic bk.)
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| 020 |
|
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|z 9781461480532
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| 020 |
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|a 1461480531
|
| 020 |
|
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|a 9781461480532
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| 024 |
7 |
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|a 10.1007/978-1-4614-8054-9
|2 doi
|
| 035 |
|
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|a (OCoLC)862822599
|
| 050 |
|
4 |
|a TK7871.85
|
| 072 |
|
7 |
|a PNRH
|2 bicssc
|
| 072 |
|
7 |
|a SCI013050
|2 bisacsh
|
| 072 |
|
7 |
|a TEC
|x 009070
|2 bisacsh
|
| 049 |
|
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|a MAIN
|
| 245 |
0 |
0 |
|a Atomic Layer Deposition for Semiconductors /
|c Cheol Seong Hwang, Cha Young Yoo, Editors.
|
| 264 |
|
1 |
|a New York :
|b Springer,
|c 2014.
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| 300 |
|
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|a 1 online resource (x, 263 pages) :
|b illustrations (some color)
|
| 336 |
|
|
|a text
|b txt
|2 rdacontent
|0 http://id.loc.gov/vocabulary/contentTypes/txt
|
| 337 |
|
|
|a computer
|b c
|2 rdamedia
|0 http://id.loc.gov/vocabulary/mediaTypes/c
|
| 338 |
|
|
|a online resource
|b cr
|2 rdacarrier
|0 http://id.loc.gov/vocabulary/carriers/cr
|
| 505 |
0 |
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|a Fundamentals -- ALD for memory devices -- ALD for logic devices -- ALD machines.
|
| 500 |
|
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|a Includes index.
|
| 520 |
|
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|a Atomic Layer Deposition (ALD) was originally designed for depositing uniform passivation layers over a very large area for display devices in the late 1970s. Only recently, in the 21st century, has the this technique become popular for high integrated semiconductor memory devices. This book discusses ALD for all modern semiconductor devices, the basic chemistry of ALD, and models of ALD processes. The book also details ALD for both mass produced memories and emerging memories. Each chapter of the book provides history, operating principles, and a full explanation of ALD processes for each device.
|
| 588 |
0 |
|
|a Online resource; title from PDF title page (SpringerLink, viewed October 21, 2013).
|
| 504 |
|
|
|a Includes bibliographical references and index.
|
| 650 |
|
0 |
|a Semiconductors
|x Surfaces.
|
| 650 |
1 |
4 |
|a Chemistry.
|
| 650 |
2 |
4 |
|a Electrochemistry.
|
| 650 |
2 |
4 |
|a Semiconductors.
|
| 650 |
2 |
4 |
|a Memory Structures.
|
| 650 |
2 |
4 |
|a Energy Technology.
|
| 650 |
2 |
4 |
|a Electronics and Microelectronics, Instrumentation.
|
| 650 |
|
7 |
|a TECHNOLOGY & ENGINEERING
|x Mechanical.
|2 bisacsh
|
| 650 |
|
7 |
|a Semiconductors
|x Surfaces.
|2 fast
|0 (OCoLC)fst01112259
|
| 655 |
|
4 |
|a Electronic books.
|
| 700 |
1 |
|
|a Seong Hwang, Cheol,
|e editor.
|1 http://viaf.org/viaf/1371159474220427662020
|
| 700 |
1 |
|
|a Yoo, Cha Young,
|e editor.
|1 http://viaf.org/viaf/865159474343027662750
|
| 856 |
4 |
0 |
|u http://link.springer.com/10.1007/978-1-4614-8054-9
|y SpringerLink
|
| 903 |
|
|
|a HeVa
|
| 929 |
|
|
|a eresource
|
| 999 |
f |
f |
|i f229df99-bc26-579c-9d2c-18254f05e2b9
|s d0a31f1e-7261-5aea-b9f9-28d734d6e801
|
| 928 |
|
|
|t Library of Congress classification
|a TK7871.85
|l Online
|c UC-FullText
|u http://link.springer.com/10.1007/978-1-4614-8054-9
|z SpringerLink
|g ebooks
|i 9891854
|
