Scanning electron microscopy : physics of image formation and microanalysis /
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Author / Creator: | Reimer, Ludwig, 1928- |
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Edition: | Second completely revised and updated edition. |
Imprint: | Berlin ; New York : Springer, [1998] ©1998 |
Description: | 1 online resource (xiv, 527 pages) : illustrations. |
Language: | English |
Series: | Springer series in optical sciences ; volume 45 Springer series in optical sciences ; v. 45. |
Subject: | |
Format: | E-Resource Book |
URL for this record: | http://pi.lib.uchicago.edu/1001/cat/bib/11086185 |
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100 | 1 | |a Reimer, Ludwig, |d 1928- |0 http://id.loc.gov/authorities/names/n83160359 |1 http://viaf.org/viaf/65163372 | |
245 | 1 | 0 | |a Scanning electron microscopy : |b physics of image formation and microanalysis / |c Ludwig Reimer. |
250 | |a Second completely revised and updated edition. | ||
264 | 1 | |a Berlin ; |a New York : |b Springer, |c [1998] | |
264 | 4 | |c ©1998 | |
300 | |a 1 online resource (xiv, 527 pages) : |b illustrations. | ||
336 | |a text |b txt |2 rdacontent |0 http://id.loc.gov/vocabulary/contentTypes/txt | ||
337 | |a computer |b c |2 rdamedia |0 http://id.loc.gov/vocabulary/mediaTypes/c | ||
338 | |a online resource |b cr |2 rdacarrier |0 http://id.loc.gov/vocabulary/carriers/cr | ||
490 | 1 | |a Springer series in optical sciences ; |v volume 45 | |
504 | |a Includes bibliographical references and index. | ||
505 | 0 | |a 1. Introduction -- 2. Electron optics of a scanning electron microscope -- 3. Electron scattering and diffusion -- 4. Emission of backscattered and secondary electrons -- 5. Electron detectors and spectrometers -- 6. Image contrast and signal processing -- 7. Electron-beam-induced current and cathodoluminescence -- 8. Special techniques in SEM -- 9. Crystal structure analysis by diffraction -- 10. Elemental analysis and imaging with X-rays. | |
520 | |a Scanning Electron Microscopy provides a description of the physics of electron-probe formation and of electron-specimen interations. The different imaging and analytical modes using secondary and backscattered electrons, electron-beam-induced currents, X-ray and Auger electrons, electron channelling effects, and cathodoluminescence are discussed to evaluate specific contrasts and to obtain quantitative information. | ||
588 | 0 | |a Print version record. | |
650 | 0 | |a Scanning electron microscopy. |0 http://id.loc.gov/authorities/subjects/sh91002757 | |
650 | 7 | |a Optique électronique. |2 eclas | |
650 | 7 | |a Instruments d'optique. |2 eclas | |
650 | 7 | |a Scanning electron microscopy. |2 fast |0 (OCoLC)fst01106480 | |
650 | 1 | 7 | |a Elektronenmicroscopie. |2 gtt |
650 | 1 | 7 | |a Verstrooiing. |2 gtt |
650 | 1 | 7 | |a Kristalstructuur. |2 gtt |
650 | 0 | 7 | |a Rasterelektronenmikroskopie. |2 swd |
655 | 4 | |a Electronic books. | |
776 | 0 | 8 | |i Print version: |a Reimer, Ludwig, 1928- |t Scanning electron microscopy. |b Second completely revised and updated edition |z 3540639764 |w (DLC) 98026178 |w (OCoLC)39281893 |
830 | 0 | |a Springer series in optical sciences ; |v v. 45. | |
856 | 4 | 0 | |u http://link.springer.com/10.1007/978-3-540-38967-5 |y SpringerLink |
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929 | |a eresource | ||
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