Thin film processes II /
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| Imprint: | Boston : Academic Press, c1991. |
|---|---|
| Description: | xiii, 866 p. : ill. ; 23 cm. |
| Language: | English |
| Subject: | |
| Format: | Print Book |
| URL for this record: | http://pi.lib.uchicago.edu/1001/cat/bib/1144542 |
Table of Contents:
- Introduction
- Glow Discharge Plasma and Sources for Etching and Deposition
- Evaporation Processes
- Molecular Beam Epitaxy
- Sputter Deposition Processes
- The Cathodic Arc Plasma Deposition of Thin Films
- Thermal Chemical Vapor Deposition
- Metal-Organic Chemical Vapor Deposition
- Photochemical Vapor Deposition
- Sol-Gel Coatings
- Plasma-Enhanced Chemical Vapor Deposition
- Formation of Inorganic Films by Remote Plasma-Enhanced Chemical-Vapor Deposition
- Selected Area Processing
- Plasma-Assisted Etching
- Ion Beam Etching
- Laser-Driven Etching
