Polycrystalline films : characteristics, applications and research /

Polycrystalline films : characteristics, applications and research /

Saved in:

Bibliographic Details
Imprint:	York : Nova Science Publishers, Inc., [2017]
Description:	1 online resource (ix, 79 pages).
Language:	English
Series:	Chemistry research and applications Chemistry research and applications series.
Subject:	Thin films. Polycrystals. Polycrystalline semiconductors. Polycrystalline semiconductors. Polycrystals. Thin films.
Format:	E-Resource Book
URL for this record:	http://pi.lib.uchicago.edu/1001/cat/bib/11549169

Hidden Bibliographic Details
Other authors / contributors:	Davis, Alfred L. (Writer on thin films), editor.
ISBN:	9781536108187 1536108189 9781536107968
Notes:	Includes bibliographical references and index. Online resource; title from digital title page (viewed on March 01, 2017).
Other form:	Print version: Polycrystalline films. Hauppauge, New York : Nova Science Publishers, Inc., [2017] 9781536107968

Description
Summary:	This book provides new research on polycrystalline films. Chapter One reviews the characterization of polycrystalline Cu2ZnSn(SxSe1-x)4 thin-films and solar-cells. Chapter Two explains the chemical vapor deposition process accelerated by the fragments of monomethylsilane. Chapter Three studies the regularities of formation of the nanostructured films of polycrystalline silicon doped with germanium as isovalent impurity.
Physical Description:	1 online resource (ix, 79 pages).
Bibliography:	Includes bibliographical references and index.
ISBN:	9781536108187 1536108189 9781536107968