Application of particle and laser beams in materials technology /
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| Imprint: | Dordrecht ; Boston : Kluwer Academic Publishers, c1995. |
|---|---|
| Description: | xi, 678 p. : ill. ; 25 cm. |
| Language: | English |
| Series: | NATO ASI series. Series E, Applied sciences ; vol. 283 NATO ASI series. Series E, Applied sciences ; no. 283. |
| Subject: | |
| Format: | Print Book |
| URL for this record: | http://pi.lib.uchicago.edu/1001/cat/bib/1738727 |
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| 245 | 0 | 0 | |a Application of particle and laser beams in materials technology / |c edited by P. Misaelides. |
| 260 | |a Dordrecht ; |a Boston : |b Kluwer Academic Publishers, |c c1995. | ||
| 300 | |a xi, 678 p. : |b ill. ; |c 25 cm. | ||
| 336 | |a text |b txt |2 rdacontent |0 http://id.loc.gov/vocabulary/contentTypes/txt | ||
| 337 | |a unmediated |b n |2 rdamedia |0 http://id.loc.gov/vocabulary/mediaTypes/n | ||
| 338 | |a volume |b nc |2 rdacarrier |0 http://id.loc.gov/vocabulary/carriers/nc | ||
| 490 | 1 | |a NATO ASI series. Series E, Applied sciences ; |v vol. 283 | |
| 500 | |a "Published in cooperation with NATO Scientific Affairs Division." | ||
| 500 | |a "Proceedings of the NATO Advanced Study on Application of Particle and Laser Beams in Materials Technology Kallithea, Chalkidiki, Greece, May 18-21, 1994"--T.p. verso. | ||
| 504 | |a Includes bibliographical references and index. | ||
| 505 | 0 | 0 | |t Fundamental Aspects of Ion Electron Interactions / |r R. Golser -- |t Fundamentals of Ion-Solid Interactions: Atomic Collisions / |r E. Steinbauer -- |t Excitation and Ionization In Fast Ion-Atom Collisions Due To Projectile-Electron - Target-Electron Interactions / |r T. J. M. Zouros -- |t Radiation Induced Point Defects and Diffusion / |r J.-P. Riviere -- |t High Temperature Oxidation and Corrosion of Metals and Alloys: Fundamentals and Influence of High Energy Beams / |r A. Galerie -- |t Thin Films of High-Temperature Superconductors: Application-Oriented Studies of Growth and Properties / |r J. Geerk, G. Linker and O. Meyer -- |t An Overview of Surface Analysis. Application to the Adsorption of Li on Single Crystals of Layered Compounds / |r C. A. Papageorgopoulos -- |t Depth Profiling in Combination with Sputtering / |r K. Wittmaack -- |t A SIMS Study of the Inter-Diffusion of Group III Atoms in a Distributed Bragg Reflection / |r G. P. Beyer, D. S. McPhail, A. Khan and M. Ghisoni -- |t Thermal He-Atom Scattering for the Study of Surface Systems: K on Si(001) / |r S. Foulias, N. Curson, M. Cowen and W. Allison -- |t Experimental and Monte Carlo Simulation Studies of the Surface Concentration Changes in ZiO[subscript 2] under Ion Bombardment / |r V. Miteva, A. Stanchev, P. Stefanov, V. Slavova and K. Kostov -- |t Ion-Induced Photon Emission of Materials and Possibilities of its Application for Surface Diagnostics / |r M. Suchanska -- |t The Raman Approach to Materials Science / |r E. Anasthassakis -- |t Laser-Material Interaction. Plasma Formation and Applications / |r C. Boulmer-Leborgne -- |t Optical Spectrometry Coupled with Laser Ablation for Analytical Applications on Solids / |r C. Geertsen and P. Mauchien -- |t In Situ Laser Beam Probes for Semiconductor Processing / |r G. Gu, H. Li, J. Cook and E. A. Ogryzlo -- |t Laser Deposition and Patterning of Diamond Films / |r A. N. Obraztsov -- |t Laser-Raman Spectroscopy of Some Lanthanide/HgI[subscript 2] Heterometallic Complexes (HL=5,7-Dimethyl-1,8-Naphthyridine-2-OL) / |r M. Lalia-Kantouri and D. M. L. Goodgame -- |t Accelerators in Materials Research / |r K. Bethge -- |t Application of Elastic Recoil Detection in Materials Analysis / |r W. M. Arnoldbik and F. H. P. M. Habraken -- |t Applications of High Energy Ion Scattering in Materials Science / |r L. J. van Ijzendoorn -- |t High Energy Heavy Ion RBS, ERDA and Channelling / |r J. A. Davies and R. Siegele -- |t Some New Detection Techniques for Light-Ion Scattering Analysis / |r M. J. A. de Voigt, H. A. Rijken and S. S. Klein -- |t Prompt Gamma Ray Resonant Nuclear Reaction Analysis for Light Elements: H, Li, F and Na / |r W. A. Lanford, K. Cummings, A. Haberl and C. Shepard -- |t Quantitative Determination of Light Elements in Semiconductor Matrices by Charged Particle Activation Analysis / |r P. Misaelides -- |t Thin Layer Activation in Materials Technology / |r M. F. Stroosnijder -- |t Optimum Industrial Application of the Thin Layer Activation Technique / |r P. M. Racolta, L. Popa-Simil, G. Pascovici, E. A. Ivanov and B. Alexandreanu -- |t Ion Beam Analysis of Glasses - Industrial Applications / |r M. Laube and F. Rauch -- |t Nuclear Reaction Analysis of Corroded Glass Surfaces / |r K. Cummings and W. A. Lanford -- |t Ion-Beam Archaeometry: Technological Assessment of Ancient and Medieval Materials / |r R. A. Jarjis -- |t Non-Destructive Analysis Of American Gold Jewelry Items By PIXE, RBS and PIGE / |r J. L. Ruvalcaba and G. Demortier -- |t Recoil Spectrometry: A Suitable Method for Studying Interfacial Reactions in Metal-InP Systems / |r L. Persson, M. Hult, H. J. Whitlow, M. El Bouanani, M. Andersson, I. F. Bubb, P. N. Johnston, S. R. Walker, D. D. Cohen, N. Dytlewski, N. Lundbert, C. Zaring and M. Ostling -- |t Bismuth-Implanted Silicon Reference Material Revisited: The Concept of Traceability and the Individual Characterisation of Chips / |r U. Watjen -- |t Energy Dispersive X-Ray Analysis of the Tin Distribution on Electrolytically Coloured Anodised Aluminium / |r N. Kallithrakas-Kontos, R. Moshohoritou and I. Tsangaraki-Kaplanoglou -- |t Determination of Sulphur and Copper Distribution on Chemically Modified HEU-Type Zeolite Crystals by Means of Nuclear Resonant Reaction Analysis Techniques, Scanning Electron Microscopy and X-Ray Fluorescence / |r A. Godelitsas, P. Misaelides, D. Charistos and E. Pavlidou -- |t Modern Technological Projects with High Power Electron Beams / |r V. I. Kukulin -- |t Computer-Aided Design of Technological Electron-Optical Systems / |r S. B. Sabchevski -- |t Ion Beam Mixing / |r J. P. Riviere -- |t Materials Modification Using Electron Beams / |r R. Mehnert -- |t Deposition and Etching Mechanisms in Plasma Thin Film Processes / |r Y. Kuo -- |t Active Modification and Amorphisation of Materials by Low-Energy Ion Irradiation / |r I. V. Tereshko, V. I. Khodyrev, V. M. Tereshko, E. A. Lipsky and I. V. Romanenko -- |t SIMOX Thin Films, Structural and Electrical Characterisation using FTIR Spectroscopy / |r C. C. Katsidis and D. I. Siapkas -- |t The Key Role of Electron Beams in IC Technology / |r M. Hatzakis -- |t Cadmium Sulphide Microcrystalline-Doped Silicon Dioxide Thin Films Prepared by RF-Sputtering: Growth and Physical Characterisation / |r A. G. Rolo, M. J. M. Gomes, M. Belsley and J. L. Ribeiro -- |t Synchrotron Radiation Sources for Materials Technology / |r E. Weihreter -- |t Photoemission and EXAFS Study of Na on 2H-TaS[subscript 2] / |r E. Holub-Krappe, S. Aminpirooz, L. Becker, M. Keil, A. Schellenberger and H. Rossner -- |t Characterisation of Nearly Stoichiometric Buried Si[subscript x]N[subscript y] Films with EXAFS and NEXAFS / |r E. C. Paloura, A. Mertens, P. Grekos and W. Frentrup. |
| 650 | 0 | |a Materials |x Effect of radiation on. |0 http://id.loc.gov/authorities/subjects/sh85082073 | |
| 650 | 0 | |a Laser beams |x Industrial applications. | |
| 650 | 7 | |a Laser beams |x Industrial applications. |2 fast |0 http://id.worldcat.org/fast/fst00992786 | |
| 650 | 7 | |a Materials |x Effect of radiation on. |2 fast |0 http://id.worldcat.org/fast/fst01011816 | |
| 700 | 1 | |a Misaelides, P. |q (Panagiotis) |0 http://id.loc.gov/authorities/names/n94113258 |1 http://viaf.org/viaf/65709042 | |
| 710 | 2 | |a North Atlantic Treaty Organization. |b Scientific Affairs Division. |0 http://id.loc.gov/authorities/names/n79142766 |1 http://viaf.org/viaf/141814054 | |
| 711 | 2 | |a NATO Advanced Study on Application of Particle and Laser Beams in Materials Technology |d (1994 : |c Kallithea, Greece) |0 http://id.loc.gov/authorities/names/n94113270 |1 http://viaf.org/viaf/312845735 | |
| 830 | 0 | |a NATO ASI series. |n Series E, |p Applied sciences ; |v no. 283. | |
| 901 | |a ToCBNA | ||
| 903 | |a HeVa | ||
| 035 | |a (OCoLC)31662275 | ||
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| 928 | |t Library of Congress classification |a TA418.6.A670 1995 |l JCL |c JCL-Sci |i 2297188 | ||
| 927 | |t Library of Congress classification |a TA418.6.A670 1995 |l JCL |c JCL-Sci |e CRERAR |b 42720778 |i 3258187 | ||
