Application of particle and laser beams in materials technology /
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| Imprint: | Dordrecht ; Boston : Kluwer Academic Publishers, c1995. |
|---|---|
| Description: | xi, 678 p. : ill. ; 25 cm. |
| Language: | English |
| Series: | NATO ASI series. Series E, Applied sciences ; vol. 283 NATO ASI series. Series E, Applied sciences ; no. 283. |
| Subject: | |
| Format: | Print Book |
| URL for this record: | http://pi.lib.uchicago.edu/1001/cat/bib/1738727 |
Table of Contents:
- Fundamental Aspects of Ion Electron Interactions / R. Golser
- Fundamentals of Ion-Solid Interactions: Atomic Collisions / E. Steinbauer
- Excitation and Ionization In Fast Ion-Atom Collisions Due To Projectile-Electron - Target-Electron Interactions / T. J. M. Zouros
- Radiation Induced Point Defects and Diffusion / J.-P. Riviere
- High Temperature Oxidation and Corrosion of Metals and Alloys: Fundamentals and Influence of High Energy Beams / A. Galerie
- Thin Films of High-Temperature Superconductors: Application-Oriented Studies of Growth and Properties / J. Geerk, G. Linker and O. Meyer
- An Overview of Surface Analysis. Application to the Adsorption of Li on Single Crystals of Layered Compounds / C. A. Papageorgopoulos
- Depth Profiling in Combination with Sputtering / K. Wittmaack
- A SIMS Study of the Inter-Diffusion of Group III Atoms in a Distributed Bragg Reflection / G. P. Beyer, D. S. McPhail, A. Khan and M. Ghisoni
- Thermal He-Atom Scattering for the Study of Surface Systems: K on Si(001) / S. Foulias, N. Curson, M. Cowen and W. Allison
- Experimental and Monte Carlo Simulation Studies of the Surface Concentration Changes in ZiO[subscript 2] under Ion Bombardment / V. Miteva, A. Stanchev, P. Stefanov, V. Slavova and K. Kostov
- Ion-Induced Photon Emission of Materials and Possibilities of its Application for Surface Diagnostics / M. Suchanska
- The Raman Approach to Materials Science / E. Anasthassakis
- Laser-Material Interaction. Plasma Formation and Applications / C. Boulmer-Leborgne
- Optical Spectrometry Coupled with Laser Ablation for Analytical Applications on Solids / C. Geertsen and P. Mauchien
- In Situ Laser Beam Probes for Semiconductor Processing / G. Gu, H. Li, J. Cook and E. A. Ogryzlo
- Laser Deposition and Patterning of Diamond Films / A. N. Obraztsov
- Laser-Raman Spectroscopy of Some Lanthanide/HgI[subscript 2] Heterometallic Complexes (HL=5,7-Dimethyl-1,8-Naphthyridine-2-OL) / M. Lalia-Kantouri and D. M. L. Goodgame
- Accelerators in Materials Research / K. Bethge
- Application of Elastic Recoil Detection in Materials Analysis / W. M. Arnoldbik and F. H. P. M. Habraken
- Applications of High Energy Ion Scattering in Materials Science / L. J. van Ijzendoorn
- High Energy Heavy Ion RBS, ERDA and Channelling / J. A. Davies and R. Siegele
- Some New Detection Techniques for Light-Ion Scattering Analysis / M. J. A. de Voigt, H. A. Rijken and S. S. Klein
- Prompt Gamma Ray Resonant Nuclear Reaction Analysis for Light Elements: H, Li, F and Na / W. A. Lanford, K. Cummings, A. Haberl and C. Shepard
- Quantitative Determination of Light Elements in Semiconductor Matrices by Charged Particle Activation Analysis / P. Misaelides
- Thin Layer Activation in Materials Technology / M. F. Stroosnijder
- Optimum Industrial Application of the Thin Layer Activation Technique / P. M. Racolta, L. Popa-Simil, G. Pascovici, E. A. Ivanov and B. Alexandreanu
- Ion Beam Analysis of Glasses - Industrial Applications / M. Laube and F. Rauch
- Nuclear Reaction Analysis of Corroded Glass Surfaces / K. Cummings and W. A. Lanford
- Ion-Beam Archaeometry: Technological Assessment of Ancient and Medieval Materials / R. A. Jarjis
- Non-Destructive Analysis Of American Gold Jewelry Items By PIXE, RBS and PIGE / J. L. Ruvalcaba and G. Demortier
- Recoil Spectrometry: A Suitable Method for Studying Interfacial Reactions in Metal-InP Systems / L. Persson, M. Hult, H. J. Whitlow, M. El Bouanani, M. Andersson, I. F. Bubb, P. N. Johnston, S. R. Walker, D. D. Cohen, N. Dytlewski, N. Lundbert, C. Zaring and M. Ostling
- Bismuth-Implanted Silicon Reference Material Revisited: The Concept of Traceability and the Individual Characterisation of Chips / U. Watjen
- Energy Dispersive X-Ray Analysis of the Tin Distribution on Electrolytically Coloured Anodised Aluminium / N. Kallithrakas-Kontos, R. Moshohoritou and I. Tsangaraki-Kaplanoglou
- Determination of Sulphur and Copper Distribution on Chemically Modified HEU-Type Zeolite Crystals by Means of Nuclear Resonant Reaction Analysis Techniques, Scanning Electron Microscopy and X-Ray Fluorescence / A. Godelitsas, P. Misaelides, D. Charistos and E. Pavlidou
- Modern Technological Projects with High Power Electron Beams / V. I. Kukulin
- Computer-Aided Design of Technological Electron-Optical Systems / S. B. Sabchevski
- Ion Beam Mixing / J. P. Riviere
- Materials Modification Using Electron Beams / R. Mehnert
- Deposition and Etching Mechanisms in Plasma Thin Film Processes / Y. Kuo
- Active Modification and Amorphisation of Materials by Low-Energy Ion Irradiation / I. V. Tereshko, V. I. Khodyrev, V. M. Tereshko, E. A. Lipsky and I. V. Romanenko
- SIMOX Thin Films, Structural and Electrical Characterisation using FTIR Spectroscopy / C. C. Katsidis and D. I. Siapkas
- The Key Role of Electron Beams in IC Technology / M. Hatzakis
- Cadmium Sulphide Microcrystalline-Doped Silicon Dioxide Thin Films Prepared by RF-Sputtering: Growth and Physical Characterisation / A. G. Rolo, M. J. M. Gomes, M. Belsley and J. L. Ribeiro
- Synchrotron Radiation Sources for Materials Technology / E. Weihreter
- Photoemission and EXAFS Study of Na on 2H-TaS[subscript 2] / E. Holub-Krappe, S. Aminpirooz, L. Becker, M. Keil, A. Schellenberger and H. Rossner
- Characterisation of Nearly Stoichiometric Buried Si[subscript x]N[subscript y] Films with EXAFS and NEXAFS / E. C. Paloura, A. Mertens, P. Grekos and W. Frentrup.
