EUV, x-ray, and gamma-ray instrumentation for astronomy X : 21-23 July 1999, Denver, Colorado /

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Bibliographic Details
Imprint:Bellingham, Wash., USA : SPIE, c1999.
Description:xvi, 838 p. : ill. (some col.) ; 28 cm.
Language:English
Series:SPIE proceedings series ; v. 3765
Proceedings of SPIE--the International Society for Optical Engineering ; v. 3765.
Subject:
Format: Print Book
URL for this record:http://pi.lib.uchicago.edu/1001/cat/bib/4234249
Hidden Bibliographic Details
Varying Form of Title:Extreme ultraviolet, X-ray, and gamma-ray instrumentation for astronomy X
EUV, X-ray, and gamma-ray instrumentation for astronomy 10
EUV, X-ray, and gamma-ray instrumentation for astronomy ten
Other authors / contributors:Siegmund, Oswald H. W.
Flanagan, Kathryn A.
Society of Photo-optical Instrumentation Engineers.
ISBN:0819432512
Notes:Includes bibliographical references and index.
Description
Physical Description:xvi, 838 p. : ill. (some col.) ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819432512