Dusty plasmas : physics, chemistry, and technological impacts in plasma processing /

Dusty plasmas : physics, chemistry, and technological impacts in plasma processing /

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Bibliographic Details
Imprint:	Chichester ; New York : Wiley, c1999.
Description:	viii, 408 p. : ill. ; 24 cm.
Language:	English
Subject:	Plasma engineering. Plasma (Ionized gases) -- Industrial applications. Dusty plasmas. Plasma chemistry. Plasma-enhanced chemical vapor deposition. Dusty plasmas. Plasma chemistry. Plasma engineering. Plasma-enhanced chemical vapor deposition. Plasma (Ionized gases) -- Industrial applications.
Format:	Print Book
URL for this record:	http://pi.lib.uchicago.edu/1001/cat/bib/4354078

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Other authors / contributors:	Bouchoule, André.
ISBN:	0471973866 (alk. paper)
Notes:	Includes bibliographical references and indexes.

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Call Number:	TA2020.D88 1999
c.1	Available Loan period: standard loan Request from Mansueto Scan and Deliver Need help? - Ask a Librarian