Dusty plasmas : physics, chemistry, and technological impacts in plasma processing /

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Bibliographic Details
Imprint:Chichester ; New York : Wiley, c1999.
Description:viii, 408 p. : ill. ; 24 cm.
Language:English
Subject:
Format: Print Book
URL for this record:http://pi.lib.uchicago.edu/1001/cat/bib/4354078
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Other authors / contributors:Bouchoule, André.
ISBN:0471973866 (alk. paper)
Notes:Includes bibliographical references and indexes.
Description
Summary:Dusty Plasmas Physics, Chemistry and Technological Impacts in Plasma Processing Edited by André Bouchoule Université d'Orléans, France Dusty Plasmas gives the reader a thorough overview of current knowledge on many aspects of the subject, from the basic science to technological implications. The basic physics and chemistry of dusty plasmas developed in the first two chapters are complemented by the more practical considerations of diagnostics and technological implications in the two final chapters. The book will be of interest to those already involved in or just discovering dusty plasmas in their research and/or industrial activity.<br> * Physics and Modelling of Dusty Plasmas<br> * Sources and Growth of Particles<br> * Diagnostics of a Dusty Plasma<br> * Technological Impacts of Dusty Plasmas
Physical Description:viii, 408 p. : ill. ; 24 cm.
Bibliography:Includes bibliographical references and indexes.
ISBN:0471973866