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00000pam a2200000 a 4500 |
| 001 |
4480457 |
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ICU |
| 005 |
20031020195700.0 |
| 008 |
990325s2000 nyua b 001 0 eng |
| 010 |
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|a 99023151
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| 020 |
|
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|a 1560726660
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| 035 |
|
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|a (OCoLC)41090657
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| 040 |
|
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|a DLC
|c DLC
|d OCoLC
|d OrLoB-B
|
| 049 |
|
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|a CGUA
|
| 050 |
0 |
0 |
|a QC1
|b .A4114 vol. 229
|a QC176.8.S8
|
| 082 |
0 |
0 |
|a 530 s
|a 530.4/16
|2 21
|
| 100 |
1 |
|
|a Galdikas, A.
|q (Arvaidas)
|0 http://id.loc.gov/authorities/names/n99024066
|1 http://viaf.org/viaf/68257942
|
| 245 |
1 |
0 |
|a Interaction of ions with condensed matter /
|c A. Galdikas and L. Praneviéus [i.e. Pranevièius].
|
| 260 |
|
|
|a Huntington, N.Y. :
|b Nova Science Publishers,
|c c2000.
|
| 300 |
|
|
|a 176 p. :
|b ill. ;
|c 27 cm.
|
| 336 |
|
|
|a text
|b txt
|2 rdacontent
|0 http://id.loc.gov/vocabulary/contentTypes/txt
|
| 337 |
|
|
|a unmediated
|b n
|2 rdamedia
|0 http://id.loc.gov/vocabulary/mediaTypes/n
|
| 338 |
|
|
|a volume
|b nc
|2 rdacarrier
|0 http://id.loc.gov/vocabulary/carriers/nc
|
| 440 |
|
0 |
|a Horizons in world physics
|v v. 229
|
| 504 |
|
|
|a Includes bibliographical references (p. [167]-174) and index.
|
| 505 |
0 |
0 |
|g 1.
|t Sputtering of Monoelemental Solids --
|g 1.1.
|t Ion Energy Losses --
|g 1.2.
|t Collision Cascades --
|g 1.3.
|t Physical Sputtering --
|g 2.
|t Sputtering of Multielement Solids --
|g 2.1.
|t Preferential Sputtering --
|g 2.2.
|t Modelling of Preferential Sputtering --
|g 3.
|t Formation of the Altered Layer --
|g 3.1.
|t Collisional Mixing --
|g 3.2.
|t Modelling of Collisional Mixing --
|g 3.3.
|t Thermal Diffusion --
|g 3.4.
|t Radiation Enhanced Diffusion --
|g 3.5.
|t Radiation Enhanced Diffusion and Sputtering --
|g 3.6.
|t Preferential Sputtering and Interdiffusion --
|g 3.7.
|t Radiation Activated Temperature Gradient Diffusion --
|g 3.8.
|t Segregation --
|g 4.
|t Surface Topography --
|g 4.1.
|t Development of Surface Roughness --
|g 4.2.
|t Roughening Effects on Ion Beam Profiling of Multilayers --
|g 4.3.
|t Modelling of Sputtering of Multilayers --
|g 5.
|t Heterogeneous Processes in Reactive Plasma --
|g 5.1.
|t Plasmochemical Etching --
|g 5.2.
|t Model of Etching Kinetics --
|g 5.3.
|t Etching Profiles --
|g 5.4.
|t Modelling of Etching Through a Mask.
|
| 650 |
|
0 |
|a Solids
|x Surfaces
|x Effect of radiation on.
|
| 650 |
|
0 |
|a Sputtering (Physics)
|0 http://id.loc.gov/authorities/subjects/sh85127061
|
| 650 |
|
7 |
|a Solids
|x Surfaces
|x Effect of radiation on.
|2 fast
|0 http://id.worldcat.org/fast/fst01125528
|
| 650 |
|
7 |
|a Sputtering (Physics)
|2 fast
|0 http://id.worldcat.org/fast/fst01131025
|
| 700 |
1 |
|
|a Prani͡avichi͡us, L.
|q (Li͡udvikas)
|1 http://viaf.org/viaf/67804778
|
| 901 |
|
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|a ToCBNA
|
| 903 |
|
|
|a HeVa
|
| 929 |
|
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|a cat
|
| 999 |
f |
f |
|i e545c8a6-c226-52ec-9225-bcba93034006
|s fb06770d-172c-53d6-a37a-0a2890b99bf1
|
| 928 |
|
|
|t Library of Congress classification
|a QC176.8.S8G3 2000
|l ASR
|c ASR-SciASR
|i 4283096
|
| 927 |
|
|
|t Library of Congress classification
|a QC176.8.S8G3 2000
|l ASR
|c ASR-SciASR
|e CRERAR
|b 56713583
|i 7079938
|
