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00000pam a22000004a 4500 |
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4697950 |
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20031021162100.0 |
| 008 |
020528s2002 ne a b 101 0 eng |
| 010 |
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|a 2002072962
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| 020 |
|
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|a 1402005245 (alk. paper)
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| 020 |
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|a 1402005253 (pbk. : alk. paper)
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| 035 |
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|a (OCoLC)49901833
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| 040 |
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|a DLC
|c DLC
|d YDX
|d OCoLC
|d OrLoB-B
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| 042 |
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|a pcc
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| 049 |
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|a CGUA
|
| 050 |
0 |
0 |
|a TA418.9.T45
|b C47 2002
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| 082 |
0 |
0 |
|a 621.3815/2
|2 21
|
| 245 |
0 |
0 |
|a Chemical physics of thin film deposition processes for micro- and nano-technologies /
|c edited by Yves Pauleau.
|
| 260 |
|
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|a Dordrecht ;
|a Boston :
|b Kluwer Academic Publishers,
|c c2002.
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| 300 |
|
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|a xiii, 363 p. :
|b ill. ;
|c 25 cm.
|
| 336 |
|
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|a text
|b txt
|2 rdacontent
|0 http://id.loc.gov/vocabulary/contentTypes/txt
|
| 337 |
|
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|a unmediated
|b n
|2 rdamedia
|0 http://id.loc.gov/vocabulary/mediaTypes/n
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| 338 |
|
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|a volume
|b nc
|2 rdacarrier
|0 http://id.loc.gov/vocabulary/carriers/nc
|
| 440 |
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0 |
|a NATO science series.
|n Series II,
|p Mathematics, physics, and chemistry ;
|v . 55
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| 500 |
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|a "Published in cooperation with NATO Scientific Affairs Division."
|
| 504 |
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|a Includes bibliographical references and index.
|
| 505 |
0 |
0 |
|t Electroplating and Electroless Deposition Processes for Electronic Components and Microsystems /
|r T. E. G. Daenen and D. L. de Kubber --
|t Self-Assembled Electroactive Ultrathin Films /
|r T. P. Cassagneau --
|t Feature and Mechanisms of Layer Growth in Liquid Phase Epitaxy of Semiconductor Materials /
|r M. Konuma --
|t Sol-Gel Deposition Processes of Thin Ceramic Films /
|r D. Sporn, P. Lobmann and U. Guntow /
|r [et al.] --
|t Thin Film Deposition by Sol-Gel and CVD Processing of Metal-Organic Precursors /
|r S. Mathur --
|t Numerical Simulation of Flow and Chemistry in Thermal Chemical Vapor Deposition Processes /
|r C. R. Kleijn --
|t Chemical Vapor Deposition of Superconductor and Oxide Films /
|r G. Wahl, J. Arndt and O. Stadel --
|t Selective Chemical Vapor Deposition /
|r J. Holleman --
|t Photochemical Vapour Deposition of Thin Films /
|r S. J. C. Irvine --
|t Reaction Mechanisms in Laser-Assisted Chemical Vapor Deposition of Microstructures /
|r Y. Pauleau and D. Tonneau --
|t Proximal Probe Induced Chemical Processing for Nanodevice Elaboration /
|r D. Tonneau, N. Clement and A. Houel /
|r [et al.] --
|t Molecular Dynamics Simulation of Thin Film Growth with Energetic Atoms /
|r C. M. Gilmore and J. A. Sprague --
|t Deposition of Thin Films by Sputtering /
|r W. Gulbinski --
|t Mass-Transport in an Austenitic Stainless Steel Under High-Flux, Low-Energy Nitrogen Ion Bombardment at Elevated Temperature /
|r L. Pranevicius, C. Templier and J.-P. Riviere /
|r [et al.].
|
| 650 |
|
0 |
|a Thin films
|v Congresses.
|0 http://id.loc.gov/authorities/subjects/sh2008112885
|
| 650 |
|
0 |
|a Nanotechnology
|v Congresses.
|0 http://id.loc.gov/authorities/subjects/sh2008108196
|
| 650 |
|
7 |
|a Nanotechnology.
|2 fast
|0 http://id.worldcat.org/fast/fst01032639
|
| 650 |
|
7 |
|a Thin films.
|2 fast
|0 http://id.worldcat.org/fast/fst01150018
|
| 655 |
|
7 |
|a Conference papers and proceedings.
|2 fast
|0 http://id.worldcat.org/fast/fst01423772
|
| 700 |
1 |
|
|a Pauleau, Y.
|0 http://id.loc.gov/authorities/names/n93073477
|1 http://viaf.org/viaf/9992766
|
| 901 |
|
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|a ToCBNA
|
| 903 |
|
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|a HeVa
|
| 929 |
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|a cat
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| 999 |
f |
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|i 9c2ea978-8d89-592e-99fb-5bb27ba23bbc
|s fef12200-9216-5e03-aa4b-c6fa156312fb
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| 928 |
|
|
|t Library of Congress classification
|a TA418.9.T45C47 2002
|l JCL
|c JCL-Sci
|i 4549313
|
| 927 |
|
|
|t Library of Congress classification
|a TA418.9.T45C47 2002
|l JCL
|c JCL-Sci
|e CRERAR
|b 60738667
|i 7304749
|
