Chemical applications of synchrotron radiation /
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| Imprint: | New Jersey : World Scientific, c2002. |
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| Description: | 2 v. (xiii, 1227 p.) : ill. ; 24 cm. |
| Language: | English |
| Series: | Advanced series in physical chemistry ; v. 12A-12B |
| Subject: | |
| Format: | Print Book |
| URL for this record: | http://pi.lib.uchicago.edu/1001/cat/bib/4773389 |
| Summary: | This book is organized into two parts, in order of increasing photon energy. Part I deals with the applications of low energy photons and covers areas such as gas phase photodissociation reactions and dynamics, soft X-ray fluorescence, IR and photoemission analysis of surfaces, spectroscopy of organic and polymeric materials, catalysts, electronic and magnetic materials, and spectromicroscopy. Part II encompasses applications using soft to hard X-rays, including spectroscopy of surface and thin films, XAFS, diffraction and scattering, and several technological applications, namely the microprobe, photoetching and tribology. |
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| Physical Description: | 2 v. (xiii, 1227 p.) : ill. ; 24 cm. |
| Bibliography: | Includes bibliographical references and indexes. |
| ISBN: | 9810244800 9810249772 9810249780 |
