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20040128114400.0 |
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020320s2002 gw a b 001 0 eng |
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|a 2002021665
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|a 3540431179 (alk. paper)
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|a DLC
|c DLC
|d DLC
|d OCoLC
|d OrLoB-B
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|a pcc
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050 |
0 |
0 |
|a QH212.A78
|b N65 2002
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082 |
0 |
0 |
|a 620/.5
|2 21
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245 |
0 |
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|a Noncontact atomic force microscopy /
|c S. Morita, R. Wiesendanger, E. Meyer, (eds.).
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260 |
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|a Berlin ;
|a New York :
|b Springer,
|c c2002.
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300 |
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|a xviii, 439 p. :
|b ill. ;
|c 25 cm.
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336 |
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|a text
|b txt
|2 rdacontent
|0 http://id.loc.gov/vocabulary/contentTypes/txt
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337 |
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|a unmediated
|b n
|2 rdamedia
|0 http://id.loc.gov/vocabulary/mediaTypes/n
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338 |
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|a volume
|b nc
|2 rdacarrier
|0 http://id.loc.gov/vocabulary/carriers/nc
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440 |
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0 |
|a Nanoscience and technology,
|x 1434-4904
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504 |
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|a Includes bibliographical references and index.
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505 |
0 |
0 |
|g 1.
|t Introduction /
|r Seizo Morita --
|g 2.
|t Principle of NC-AFM /
|r Franz J. Giessibl --
|g 3.
|t Semiconductor Surfaces /
|r Seizo Morita and Yasuhiro Sugawara --
|g 4.
|t Bias Dependence of NC-AFM Images and Tunneling Current Variations on Semiconductor Surfaces /
|r Toyoko Arai and Masahiko Tomitori --
|g 5.
|t Alkali Halides /
|r Roland Bennewitz, Martin Bammerlin and Ernst Meyer --
|g 6.
|t Atomic Resolution Imaging on Fluorides /
|r Michael Reichling and Clemens Barth --
|g 7.
|t Atomically Resolved Imaging of a NiO(001) Surface /
|r Hirotaka Hosoi, Kazuhisa Sueoka, Kazunobu Hayakawa and Koichi Mukasa --
|g 8.
|t Atomic Structure, Order and Disorder on High Temperature Reconstructed [alpha]-Al[subscript 2]O[subscript 3](0001) /
|r Clemens Barth and Michael Reichling --
|g 9.
|t NC-AFM Imaging of Surface Reconstructions and Metal Growth on Oxides /
|r Chi Lun Pang and Geoff Thornton --
|g 10.
|t Atoms and Molecules on TiO[subscript 2](110) and CeO[subscript 2](111) Surfaces /
|r Ken-ichi Fukui and Yasuhiro Iwasawa --
|g 11.
|t NC-AFM Imaging of Adsorbed Molecules /
|r Yasuhiro Sugawara --
|g 12.
|t Organic Molecular Films /
|r Hirofumi Yamada --
|g 13.
|t Single-Molecule Analysis /
|r Akira Sasahara and Hiroshi Onishi --
|g 14.
|t Low-Temperature Measurements: Principles, Instrumentation, and Application /
|r Wolf Allers, Alexander Schwarz and Udo D. Schwarz --
|g 15.
|t Theory of Non-Contact Atomic Force Microscopy /
|r Masaru Tsukada, Naruo Sasaki, Michel Gauthier, Katsunori Tagami and Satoshi Watanabe --
|g 16.
|t Chemical Interaction in NC-AFM on Semiconductor Surfaces /
|r San-Huang Ke, Tsuyoshi Uda, Kiyoyuki Terakura, Ruben Perez and Ivan Stich --
|g 17.
|t Contrast Mechanisms on Insulating Surfaces /
|r Adam Foster, Alexander Shluger, Clemens Barth and Michael Reichling --
|g 18.
|t Analysis of Microscopy and Spectroscopy Experiments /
|r Hendrik Holscher --
|g 19.
|t Theory of Energy Dissipation into Surface Vibrations /
|r Michel Gauthier, Lev Kantorovich and Masaru Tsukada --
|g 20.
|t Measurement of Dissipation Induced by Tip - Sample Interactions /
|r H. J. Hug and A. Baratoff.
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650 |
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0 |
|a Atomic force microscopy.
|0 http://id.loc.gov/authorities/subjects/sh94008704
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650 |
|
7 |
|a Atomic force microscopy.
|2 fast
|0 http://id.worldcat.org/fast/fst00820609
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700 |
1 |
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|a Morita, S.
|q (Seizo),
|d 1948-
|0 http://id.loc.gov/authorities/names/n2002019521
|1 http://viaf.org/viaf/39664246
|
700 |
1 |
|
|a Wiesendanger, R.
|q (Roland),
|d 1961-
|0 http://id.loc.gov/authorities/names/n91091001
|1 http://viaf.org/viaf/112515169
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700 |
1 |
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|a Meyer, E.
|q (Ernst)
|d 1962-
|1 http://viaf.org/viaf/61611792
|
903 |
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|a HeVa
|
035 |
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|a (OCoLC)49493475
|
929 |
|
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|a cat
|
999 |
f |
f |
|i 9667d47f-554f-5669-bc23-ebf2cfa5079c
|s 9e594e62-b610-5c8d-935b-d7e5b72d9dab
|
928 |
|
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|t Library of Congress classification
|a QH212.A78 N65 2002
|l JCL
|c JCL-Sci
|i 4336879
|
927 |
|
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|t Library of Congress classification
|a QH212.A78 N65 2002
|l JCL
|c JCL-Sci
|e MAYB
|e CRERAR
|b 63301380
|i 7387453
|