Introduction to complex plasmas /

Introduction to complex plasmas /

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Bibliographic Details
Author / Creator:	Bonitz, Michael, 1960-
Imprint:	Heidelberg ; New York : Springer, c2010.
Description:	1 online resource (xvii, 447 p.) : ill. (some col.)
Language:	English
Series:	Springer series on atomic, optical, and plasma physics, 1615-5653 ; 59 Springer series on atomic, optical, and plasma physics ; 59.
Subject:	Plasma (Ionized gases) Plasma (Ionized gases)
Format:	E-Resource Book
URL for this record:	http://pi.lib.uchicago.edu/1001/cat/bib/8894849

Hidden Bibliographic Details
Other authors / contributors:	Horing, Norman J. M. Ludwig, Patrick.
ISBN:	9783642105920 3642105920
Notes:	Includes bibliographical references and index. Description based on print version record.
Summary:	Complex plasmas differ from traditional plasmas in many ways: these are low-temperature high pressure systems containing nanometer to micrometer size particles which may be highly charged and strongly interacting. The particles may be chemically reactive or be in contact with solid surfaces, and the electrons may show quantum behaviour. These interesting properties have led to many applications of complex plasmas in technology, medicine and science. Yet complex plasmas are very complicated, both experimentally and theoretically, and require a variety of new approaches which go beyond standard plasma physics courses. This book fills this gap presenting an introduction to theory, experiment and computer simulation in this field. Based on tutorial lectures at a very successful recent Summer Institute, the presentation is ideally suited for graduate students, plasma physicists and experienced undergraduates. --Book Jacket.
Other form:	Print version: Bonitz, Michael, 1960- Introduction to complex plasmas. Heidelberg ; New York : Springer, c2010 9783642105913 3642105912

Table of Contents:

pt. 1. Introduction
pt. 2. Classical and quantum plasmas
pt. 3. Strongly coupled and dusty plasmas
pt. 4. Reactive plasmas, plasma-surface interaction, and technological applications.