Helium ion microscopy : principles and applications /

Helium ion microscopy : principles and applications /

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Bibliographic Details
Author / Creator:	Joy, David C., 1943-, author.
Imprint:	New York : Springer, 2013.
Description:	1 online resource (viii, 64 pages) : illustrations.
Language:	English
Series:	SpringerBriefs in Materials, 2192-1091 SpringerBriefs in Materials,
Subject:	Field ion microscopy. Helium ions. Ion bombardment. Field ion microscopy. Helium ions. Ion bombardment.
Format:	E-Resource Book
URL for this record:	http://pi.lib.uchicago.edu/1001/cat/bib/9852663

Hidden Bibliographic Details
ISBN:	9781461486602 (electronic bk.) 1461486602 (electronic bk.) 9781461486596
Notes:	Includes bibliographical references and index. Description based on online resource; title from PDF title page (SpringerLink, viewed September 16, 2013).
Summary:	Helium Ion Microscopy: Principles and Applications describes the theory and discusses the practical details of why scanning microscopes using beams of light ions such as the Helium Ion Microscope (HIM) are destined to become the imaging tools of choice for the 21st century. Topics covered include the principles, operation, and performance of the Gaseous Field Ion Source (GFIS), and a comparison of the optics of ion and electron beam microscopes including their operating conditions, resolution, and signal-to-noise performance. The physical principles of Ion-Induced Secondary Electron (iSE) generation by ions are discussed, and an extensive database of iSE yields for many elements and compounds as a function of incident ion species and its energy is included. Beam damage and charging are frequently outcomes of ion beam irradiation, and techniques to minimize such problems are presented. In addition to imaging, ions beams can be used for the controlled deposition, or removal, of selected materials with nanometer precision. The techniques and conditions required for nanofabrication are discussed and demonstrated. Finally, the problem of performing chemical microanalysis with ion beams is considered. Low energy ions cannot generate X-ray emissions, so alternative techniques such as Rutherford Backscatter Imaging (RBI) or Secondary Ion Mass Spectrometry (SIMS) are examined. Presents a detailed physical model of ion-solid interactions and signal generation Provides a detailed database of iSE yield behavior as a function of the target ion, element, and energy
Standard no.:	10.1007/978-1-4614-8660-2

Table of Contents:

Introduction to Helium Ion Microscopy
Microscopy with Ions: A Brief History
Operating the Helium Ion Microscope
Ion-Solid Interactions and Image Formation
Charging and Damage
Microanalysis with HIM
Ion-Generated Damage
Working with Other Ion beams
Patterning and Nanofabrication.