EUV, x-ray, and gamma-ray instrumentation for astronomy and atomic physics : 7-11 August 1989, San Diego, California /

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Bibliographic Details
Imprint:Bellingham, Wash., USA : SPIE, 1989.
Description:x, 680 p. : ill. ; 28 cm.
Language:English
Series:Proceedings / SPIE--the International Society for Optical Engineering ; v. 1159
Proceedings of SPIE--the International Society for Optical Engineering v. 1159.
Subject:
Format: Print Book
URL for this record:http://pi.lib.uchicago.edu/1001/cat/bib/1017765
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Other authors / contributors:Hailey, Charles J.
Siegmund, Oswald H. W.
Society of Photo-optical Instrumentation Engineers
New Mexico State University. Applied Optics Laboratory
ISBN:0819401951
Notes:Sponsored by SPIE--the International Society for Optical Engineering; cooperating organizations, Applied Optics Laboratory, New Mexico State University, and others.
Includes bibliographical references and index.