Hidden Bibliographic Details
| Other authors / contributors: | Seong Hwang, Cheol, editor.
Yoo, Cha Young, editor.
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| ISBN: | 9781461480549
146148054X
9781461480532
1461480531
9781461480532
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| Notes: | Includes index.
Includes bibliographical references and index.
Online resource; title from PDF title page (SpringerLink, viewed October 21, 2013).
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| Summary: | Atomic Layer Deposition (ALD) was originally designed for depositing uniform passivation layers over a very large area for display devices in the late 1970s. Only recently, in the 21st century, has the this technique become popular for high integrated semiconductor memory devices. This book discusses ALD for all modern semiconductor devices, the basic chemistry of ALD, and models of ALD processes. The book also details ALD for both mass produced memories and emerging memories. Each chapter of the book provides history, operating principles, and a full explanation of ALD processes for each device.
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| Standard no.: | 10.1007/978-1-4614-8054-9
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