Dry etching technology for semiconductors /

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Bibliographic Details
Author / Creator:Nojiri, Kazuo, author.
Imprint:Cham : Springer, [2014]
©2015
Description:1 online resource (xiii, 116 pages) : illustrations
Language:English
Subject:
Format: E-Resource Book
URL for this record:http://pi.lib.uchicago.edu/1001/cat/bib/11089094
Hidden Bibliographic Details
ISBN:9783319102955
3319102958
9783319102948
Notes:"Based on translation from the Japanese language edition: Hajimete no handotai dry etching gijutsu by Kazuo Nojiri."
Includes bibliographical references.
Online resource; title from PDF title page (SpringerLink, viewed November 10, 2014).
Summary:This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which part of the flow dry etching is actually used. The content is designed as a practical guide for engineers working at chip makers, equipment suppliers and materials suppliers, and university students studying plasma, focusing on the topics they need most, such as detailed etching processes.
Other form:Print version: Nojiri, Kazuo. Hajimete No Handotai Dry Etching Gijutsu. Cham : Springer International Publishing, ©2014 9783319102948