Soft x-rays and extreme ultraviolet radiation : principles and applications /

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Bibliographic Details
Author / Creator:Attwood, David T.
Imprint:Cambridge ; New York : Cambridge University Press, 2000.
Description:1 online resource (xvi, 470 pages) : illustrations (some color)
Language:English
Subject:
Format: E-Resource Book
URL for this record:http://pi.lib.uchicago.edu/1001/cat/bib/11166644
Hidden Bibliographic Details
ISBN:9781139164429
1139164422
9781139648936
1139648934
0521652146
9780521652148
9781139638487
1139638483
Notes:Includes bibliographical references and index.
Print version record.
Summary:"This self-contained, comprehensive book describes the fundamental properties of soft x-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft x-ray biomicroscopy."--BOOK JACKET. "The book will be of interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practicing engineers involved in semiconductor fabrication and materials science."--Jacket.
Other form:Print version: Attwood, David T. Soft x-rays and extreme ultraviolet radiation. Cambridge ; New York : Cambridge University Press, 2000 0521652146