Low energy ion assisted film growth /

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Bibliographic Details
Author / Creator:González-Elipe, A. R.
Imprint:London : Imperial College Press ; Singapore : World Scientific [distributor], ©2003.
Description:1 online resource (xiv, 283 pages) : illustrations
Language:English
Subject:
Format: E-Resource Book
URL for this record:http://pi.lib.uchicago.edu/1001/cat/bib/11179058
Hidden Bibliographic Details
Other authors / contributors:Yubero, F.
Sanz, J. M. (José María)
ISBN:9781848161320
1848161328
1281865931
9781281865939
9781860943515
1860943519
1860943519
Notes:Includes bibliographical references and index.
English.
Print version record.
Summary:This book is an introductory manual for Ion Assisted Deposition (IAD) procedures of thin films. It is addressed to researchers, post-graduates and even engineers with little or no experience in the techniques of thin film deposition. It reviews the basic concepts related to the interaction of low energy ion beams with materials. The main procedures used for IAD synthesis of thin films and the main effects of ion beam bombardment on growing films, such as densification, stress, mixing, surface flattening and changes in texture are critically discussed. A description of some of the applications of IAD methods and a review of the synthesis by IAD of diamond-like carbon and cubic-boron nitride complete the book.
Other form:Print version: González-Elipe, A.R. Low energy ion assisted film growth. London : Imperial College Press ; Singapore : World Scientific [distributor], ©2003 1860943519 9781860943515
Standard no.:9781860943515