Low energy ion assisted film growth /

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Bibliographic Details
Author / Creator:González-Elipe, A. R.
Imprint:London : Imperial College Press ; Singapore : World Scientific [distributor], ©2003.
Description:1 online resource (xiv, 283 pages) : illustrations
Language:English
Subject:
Format: E-Resource Book
URL for this record:http://pi.lib.uchicago.edu/1001/cat/bib/11179058
Hidden Bibliographic Details
Other authors / contributors:Yubero, F.
Sanz, J. M. (José María)
ISBN:9781848161320
1848161328
1281865931
9781281865939
9781860943515
1860943519
1860943519
Notes:Includes bibliographical references and index.
English.
Print version record.
Summary:This book is an introductory manual for Ion Assisted Deposition (IAD) procedures of thin films. It is addressed to researchers, post-graduates and even engineers with little or no experience in the techniques of thin film deposition. It reviews the basic concepts related to the interaction of low energy ion beams with materials. The main procedures used for IAD synthesis of thin films and the main effects of ion beam bombardment on growing films, such as densification, stress, mixing, surface flattening and changes in texture are critically discussed. A description of some of the applications of IAD methods and a review of the synthesis by IAD of diamond-like carbon and cubic-boron nitride complete the book.
Other form:Print version: González-Elipe, A.R. Low energy ion assisted film growth. London : Imperial College Press ; Singapore : World Scientific [distributor], ©2003 1860943519 9781860943515
Standard no.:9781860943515

MARC

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100 1 |a González-Elipe, A. R.  |0 http://id.loc.gov/authorities/names/n96029361 
245 1 0 |a Low energy ion assisted film growth /  |c A.R. González-Elipe, F. Yubero, J.M. Sanz. 
260 |a London :  |b Imperial College Press ;  |a Singapore :  |b World Scientific [distributor],  |c ©2003. 
300 |a 1 online resource (xiv, 283 pages) :  |b illustrations 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
504 |a Includes bibliographical references and index. 
505 0 |a Cover -- Contents -- Foreword -- CHAPTER 1: BASIC CONCEPTS ON THE INTERACTION OF LOW ENERGY ION BEAMS WITH SOLID TARGETS -- 1.1. Introduction -- 1.2. Interatomic interaction -- 1.3. Basic concepts in classical dynamics of binary elastic collisions -- 1.4. Range of energetic ions in solids -- 1.5. Spatial distribution of deposited energy -- 1.6. Damage induced by ion bombardment -- 1.7. Sputtering -- 1.8. Experimental parameters in IAD thin film growth -- References -- CHAPTER 2: ION ASSISTED METHODS OF PREPARATION OF THIN FILMS -- 2.1. Assistance of film growth with independent ion sources -- 2.2. Ion assisted deposition of thin films without independent ion sources -- 2.3. Plasma immersion ion implantation -- 2.4. Broad beam ion sources -- References -- CHAPTER 3: EFFECTS INDUCED BY THE ION ASSISTANCE OF FILM GROWTH -- 3.1. Ion beam effects during film growth -- 3.2. Nucleation and growth of thin films under ion bombardment & 
588 0 |a Print version record. 
520 |a This book is an introductory manual for Ion Assisted Deposition (IAD) procedures of thin films. It is addressed to researchers, post-graduates and even engineers with little or no experience in the techniques of thin film deposition. It reviews the basic concepts related to the interaction of low energy ion beams with materials. The main procedures used for IAD synthesis of thin films and the main effects of ion beam bombardment on growing films, such as densification, stress, mixing, surface flattening and changes in texture are critically discussed. A description of some of the applications of IAD methods and a review of the synthesis by IAD of diamond-like carbon and cubic-boron nitride complete the book. 
546 |a English. 
650 0 |a Thin films  |x Design and construction. 
650 0 |a Thin films  |x Effect of radiation on. 
650 0 |a Ion bombardment.  |0 http://id.loc.gov/authorities/subjects/sh85067792 
650 7 |a TECHNOLOGY & ENGINEERING  |x Electronics  |x Solid State.  |2 bisacsh 
650 7 |a TECHNOLOGY & ENGINEERING  |x Electronics  |x Semiconductors.  |2 bisacsh 
650 7 |a Ion bombardment.  |2 fast  |0 (OCoLC)fst00978567 
650 7 |a Thin films  |x Design and construction.  |2 fast  |0 (OCoLC)fst01150022 
650 7 |a Thin films  |x Effect of radiation on.  |2 fast  |0 (OCoLC)fst01150023 
655 0 |a Electronic books. 
655 4 |a Electronic books. 
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700 1 |a Sanz, J. M.  |q (José María)  |0 http://id.loc.gov/authorities/names/no2001002757 
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