Low energy ion assisted film growth /

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Bibliographic Details
Author / Creator:	González-Elipe, A. R.
Imprint:	London : Imperial College Press ; Singapore : World Scientific [distributor], ©2003.
Description:	1 online resource (xiv, 283 pages) : illustrations
Language:	English
Subject:	Thin films -- Design and construction. Thin films -- Effect of radiation on. Ion bombardment. Ion bombardment. Thin films -- Design and construction. Thin films -- Effect of radiation on. Electronic books.
Format:	E-Resource Book
URL for this record:	http://pi.lib.uchicago.edu/1001/cat/bib/11179058

Hidden Bibliographic Details
Other authors / contributors:	Yubero, F. Sanz, J. M. (José María)
ISBN:	9781848161320 1848161328 1281865931 9781281865939 9781860943515 1860943519 1860943519
Notes:	Includes bibliographical references and index. English. Print version record.
Summary:	This book is an introductory manual for Ion Assisted Deposition (IAD) procedures of thin films. It is addressed to researchers, post-graduates and even engineers with little or no experience in the techniques of thin film deposition. It reviews the basic concepts related to the interaction of low energy ion beams with materials. The main procedures used for IAD synthesis of thin films and the main effects of ion beam bombardment on growing films, such as densification, stress, mixing, surface flattening and changes in texture are critically discussed. A description of some of the applications of IAD methods and a review of the synthesis by IAD of diamond-like carbon and cubic-boron nitride complete the book.
Other form:	Print version: González-Elipe, A.R. Low energy ion assisted film growth. London : Imperial College Press ; Singapore : World Scientific [distributor], ©2003 1860943519 9781860943515
Standard no.:	9781860943515

Table of Contents:

Cover
Contents
Foreword
CHAPTER 1: BASIC CONCEPTS ON THE INTERACTION OF LOW ENERGY ION BEAMS WITH SOLID TARGETS
1.1. Introduction
1.2. Interatomic interaction
1.3. Basic concepts in classical dynamics of binary elastic collisions
1.4. Range of energetic ions in solids
1.5. Spatial distribution of deposited energy
1.6. Damage induced by ion bombardment
1.7. Sputtering
1.8. Experimental parameters in IAD thin film growth
References
CHAPTER 2: ION ASSISTED METHODS OF PREPARATION OF THIN FILMS
2.1. Assistance of film growth with independent ion sources
2.2. Ion assisted deposition of thin films without independent ion sources
2.3. Plasma immersion ion implantation
2.4. Broad beam ion sources
References
CHAPTER 3: EFFECTS INDUCED BY THE ION ASSISTANCE OF FILM GROWTH
3.1. Ion beam effects during film growth
3.2. Nucleation and growth of thin films under ion bombardment &

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