Defects and diffusion, theory and simulation : an annual retrospective I /

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Bibliographic Details
Imprint:	Stafa-Zurich : Trans Tech Publications, [2009]
Description:	1 online resource (268 pages) : illustrations
Language:	English
Series:	Diffusion and defect data. Part A, Diffusion and defect forum, 1012-0386 ; v. 294 Diffusion and defect data. Pt. A, Defect and diffusion forum ; v. 294.
Subject:	Semiconductors -- Defects. Semiconductors -- Diffusion. Semiconductors -- Defects. Semiconductors -- Diffusion. Electronic books.
Format:	E-Resource Book
URL for this record:	http://pi.lib.uchicago.edu/1001/cat/bib/11217732

Hidden Bibliographic Details
Other authors / contributors:	Fisher, D. J., editor.
ISBN:	9783038132936 3038132934 3037850434 9783908451761 3908451760
Notes:	Includes bibliographical references and indexes. Print version record.
Summary:	This first volume, in a new series covering entirely general results in the fields of defects and diffusion, includes abstracts of papers which appeared between the beginning of 2008 and the end of October 2009 (journal availability permitting). This new series replaces the 'general' section which was previously part of each issue of the Metals, Ceramics and Semiconductor retrospective series. As well as 356 abstracts, the volume includes original papers on all of the usual material groups: ""Predicting Diffusion Coefficients from First Principles via Eyring's Reaction Rate Theory"" (Mantina,
Other form:	Print version: Defects and diffusion, theory and simulation : monograph. Stafa-Zuerich : Trans Tech Publications, 2009- 3908451760

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