Stress-induced phenomena in metallization : first international workshop, Ithaca, NY, 1991 /

Stress-induced phenomena in metallization : first international workshop, Ithaca, NY, 1991 /

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Bibliographic Details
Imprint:New York : American Institute of Physics, ©1992.
Description:vii, 280 pages : illustrations ; 25 cm.
Language:English
Series:American Vacuum Society series ; 13
AIP conference proceedings, 1551-7616 ; no. 263
American Vacuum Society series ; 13.
AIP conference proceedings ; no. 263.
Subject:
Semiconductors -- Defects -- Congresses.
Metallic films -- Congresses.
Thin film devices -- Defects -- Congresses.
Aluminum films -- Congresses.
Metallizing -- Congresses.
Aluminum films.
Metallic films.
Metallizing.
Semiconductors -- Defects.
Thin film devices -- Defects.
Conference papers and proceedings.
Format: E-Resource Book
URL for this record:http://pi.lib.uchicago.edu/1001/cat/bib/11321916
Hidden Bibliographic Details
Other authors / contributors:Li, Che-Yu.
Totta, Paul.
Ho, P. S.
ISBN:1563960826
9781563960826
Notes:"DOE CONF-9109327"--Title page verso.
Includes bibliographical references and index.
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