Chemical vapor deposition (CVD) : types, uses, and selected research /

Chemical vapor deposition (CVD) : types, uses, and selected research /

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Bibliographic Details
Imprint:	Hauppauge, New York : Nova Science Publishers, Inc., [2017]
Description:	1 online resource.
Language:	English
Series:	Chemistry research and applications
Subject:	Chemical vapor deposition. Vapor-plating. Thin films. Chemical vapor deposition. Thin films. Vapor-plating.
Format:	E-Resource Book
URL for this record:	http://pi.lib.uchicago.edu/1001/cat/bib/11549333

Hidden Bibliographic Details
Other authors / contributors:	Powell, Monica, editor.
ISBN:	9781536109085 1536109088 9781536108934 (softcover)
Notes:	Includes bibliographical references and index. Description based on print version record and CIP data provided by publisher; resource not viewed.
Other form:	Print version: Chemical vapor deposition (CVD) Hauppauge, New York : Nova Science Publishers, Inc., [2017] 9781536108934

Description
Summary:	This book provides new research on types and uses of chemical vapor deposition (CVD). Chapter One focuses on the synthesis and characteristics of carbon nanofibers based on phenolic resin and transition metal catalysts by CVD. Chapter Two provides an overview of different reactor types that have been proved to be viable options for graphene growth. Chapter Three outlines the significance of atmospheric pressure chemical vapor deposition technology in large area graphene electrodes and demonstrates their use in lithium ion batteries towards the advancement of their performance. Chapter Four analyzes low-energy plasma CVD for epitaxy and in-situ doping of group-IV semiconductors in nanoelectronics.
Physical Description:	1 online resource.
Bibliography:	Includes bibliographical references and index.
ISBN:	9781536109085 1536109088 9781536108934