Ultra clean processing of semiconductor surfaces XIV : 14th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (14th UCPSS 2018) held in Bruges, Belgium, September 22-24, 2008 /
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| Meeting name: | International Symposium on Ultra Clean Processing of Semiconductor Surfaces (14th : 2018 : Leuven, Belgium), author. |
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| Imprint: | Stafa-Zuerich, Switzerland : Trans Tech Publications Ltd, [2018] |
| Description: | 1 online resource : color illustrations |
| Language: | English |
| Subject: | |
| Format: | E-Resource Book |
| URL for this record: | http://pi.lib.uchicago.edu/1001/cat/bib/12021451 |
| Summary: | The 14th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (14th UCPSS 2018, Leuven, Belgium, September 3-5, 2018) was organized by IMEC and the scope of this symposium includes all issues related to contamination, cleaning and surface preparation in mainstream large-scale Integrated Circuit manufacturing. This collection will be interesting and useful for experts in the field of microelectronics. |
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| Item Description: | "Selected, peer reviewed papers from the 14th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (14th UCPSS 2018), September 3-5, 2018, Leuven, Belgium." |
| Physical Description: | 1 online resource : color illustrations |
| Bibliography: | Includes bibliographical references and indexes. |
| ISBN: | 9783035734171 3035734178 9783035714173 3035714177 |