Characterization in Silicon Processing /

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Bibliographic Details
Author / Creator:Strausser, Yale, author.
Edition:1st edition.
Imprint:Newnes, 2013.
Description:1 online resource (240 pages)
Language:English
Subject:
Format: E-Resource Book
URL for this record:http://pi.lib.uchicago.edu/1001/cat/bib/13682821
Hidden Bibliographic Details
Other authors / contributors:Safari, an O'Reilly Media Company.
ISBN:9780080523422
9780750691727
Digital file characteristics:text file
Notes:Made available through: Safari, an O'Reilly Media Company.
Online resource; Title from title page (viewed October 22, 2013)
Summary:This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to discuss typical problems seen throughout that films' history, including characterization tools which are most effectively used to clarifying and solving those problems.
Standard no.:C20090261617
9780080523422