$X-ray diffraction at elevated temperatures : a method for in situ process analysis /$

X-ray diffraction at elevated temperatures : a method for in situ process analysis /

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Bibliographic Details
Imprint:	New York : VCH, c1993.
Description:	viii, 268 p. : ill. ; 24 cm.
Language:	English
Subject:	X-rays -- Diffraction X-rays -- Industrial applications X-rays -- Diffraction. X-rays -- Industrial applications.
Format:	Print Book
URL for this record:	http://pi.lib.uchicago.edu/1001/cat/bib/1471845

Hidden Bibliographic Details
Other authors / contributors:	Chung, Deborah D. L.
ISBN:	0895737450 3527278427
Notes:	Includes bibliographical references and index.

Mansueto

Holdings details from Mansueto
Call Number:	QC482.D5X740 1993
c.1	Available Loan period: standard loan Request from Mansueto Scan and Deliver Need help? - Ask a Librarian