X-ray diffraction at elevated temperatures : a method for in situ process analysis /

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Bibliographic Details
Imprint:New York : VCH, c1993.
Description:viii, 268 p. : ill. ; 24 cm.
Language:English
Subject:
Format: Print Book
URL for this record:http://pi.lib.uchicago.edu/1001/cat/bib/1471845
Hidden Bibliographic Details
Other authors / contributors:Chung, Deborah D. L.
ISBN:0895737450
3527278427
Notes:Includes bibliographical references and index.

MARC

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245 0 0 |a X-ray diffraction at elevated temperatures :  |b a method for in situ process analysis /  |c D.D.L. Chung ... [et al.]. 
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300 |a viii, 268 p. :  |b ill. ;  |c 24 cm. 
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504 |a Includes bibliographical references and index. 
505 0 0 |g 1.  |t Review of X-ray Diffraction /  |r H. Arnold and D. D. L. Chung --  |g 2.  |t X-ray Diffraction at Elevated Temperatures Using Intense X-ray Sources /  |r H. Arnold --  |g 3.  |t X-ray Diffraction at Elevated Temperatures Using Position-Sensitive Detectors /  |r D. Ghosh --  |g 4.  |t Instrumentation of X-ray Diffraction at Elevated Temperatures /  |r P. W. DeHaven --  |g 5.  |t In Situ Process Analysis at Elevated Temperatures /  |r D. D. L. Chung --  |g 6.  |t Applications of X-ray Diffraction at Elevated Temperatures /  |r D. D. L. Chung --  |g 7.  |t Kinetic Study Using X-ray Diffraction at Elevated Temperatures /  |r P. W. DeHaven. 
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