Dusty plasmas : physics, chemistry, and technological impacts in plasma processing /

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Bibliographic Details
Imprint:Chichester ; New York : Wiley, c1999.
Description:viii, 408 p. : ill. ; 24 cm.
Language:English
Subject:
Format: Print Book
URL for this record:http://pi.lib.uchicago.edu/1001/cat/bib/4354078
Hidden Bibliographic Details
Other authors / contributors:Bouchoule, André.
ISBN:0471973866 (alk. paper)
Notes:Includes bibliographical references and indexes.

MARC

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245 0 0 |a Dusty plasmas :  |b physics, chemistry, and technological impacts in plasma processing /  |c edited by André Bouchoule. 
260 |a Chichester ;  |a New York :  |b Wiley,  |c c1999. 
300 |a viii, 408 p. :  |b ill. ;  |c 24 cm. 
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504 |a Includes bibliographical references and indexes. 
505 0 0 |g Ch. 1.  |t Physics and Modelling of Dusty Plasmas /  |r J.-P. Boeuf and C. Punset --  |g Ch. 2.  |t Sources and Growth of Particles /  |r Jerome Perrin --  |g Ch. 3.  |t Diagnostics of a Dusty Plasma /  |r L. Boufendi, W. Stoffels and E. Stoffels --  |g Ch. 4.  |t Technological Impacts of Dusty Plasmas /  |r Andre Bouchoule. 
650 0 |a Plasma engineering.  |0 http://id.loc.gov/authorities/subjects/sh85103069 
650 0 |a Plasma (Ionized gases)  |x Industrial applications. 
650 0 |a Dusty plasmas.  |0 http://id.loc.gov/authorities/subjects/sh99001149 
650 0 |a Plasma chemistry.  |0 http://id.loc.gov/authorities/subjects/sh85103059 
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650 7 |a Plasma-enhanced chemical vapor deposition.  |2 fast  |0 http://id.worldcat.org/fast/fst01066369 
650 7 |a Plasma (Ionized gases)  |x Industrial applications.  |2 fast  |0 http://id.worldcat.org/fast/fst01066270 
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