Accurate linewidth measurement on integrated-circuit photomasks /

Accurate linewidth measurement on integrated-circuit photomasks /

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Bibliographic Details
Imprint:	Washington, D.C. : U.S. Dept. of Commerce, National Bureau of Standards : U.S. Govt. Print. Off. : For sale by the Supt. of Docs., U.S. Govt. Print. Off., 1980.
Description:	x, 154 p. : ill. ; 26 cm.
Language:	English
Series:	Semiconductor measurement technology NBS special publication 440-43
Subject:	Integrated circuits -- Masks -- Measurement. Integrated circuits -- Masks -- Measurement.
Format:	U.S. Federal Government Document Print Book
URL for this record:	http://pi.lib.uchicago.edu/1001/cat/bib/6215462

Hidden Bibliographic Details
Other authors / contributors:	Jerke, John M. Center for Electronics and Electrical Engineering (U.S.). Electron Devices Division. United States. Defense Advanced Research Projects Agency. United States. National Bureau of Standards.
ISBN:	$5.00
Notes:	"Issued February 1980." "Supported by the Defense Advanced Research Projects Agency ... and the National Bureau of Standards." Includes bibliographical references.
Govt.docs classification:	C 13.10:400-43

Mansueto

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Call Number:	QC100.U524 no.400-43
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