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20120301121600.0 |
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m d |
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cr gn| |
008 |
061004s2006 njua ob 001 0 eng d |
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|a 0471414522 (hbk.)
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|a 9780471414520 (hbk.)
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|a 0470007788 (eBook)
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|a 9780470007785 (eBook)
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024 |
7 |
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|a 10.1002/0470007788
|2 doi
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035 |
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|a IEEEWiley85821071
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035 |
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|a (OCoLC)85821071
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040 |
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|a DG1
|b eng
|c DG1
|d BAKER
|d OKU
|d UMC
|d IEEEE
|d DG1
|d UPM
|d OCLCQ
|
049 |
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|a CGUA
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082 |
0 |
4 |
|a 670.42
|2 22
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|a TK7870
|b .W36 2006
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100 |
1 |
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|a Welker, R. W.
|0 http://id.loc.gov/authorities/names/n82035180
|1 http://viaf.org/viaf/30877487
|
245 |
1 |
0 |
|a Contamination and ESD control in high technology manufacturing /
|c Roger W. Welker, R. Nagarajan, Carl E. Newberg.
|
260 |
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|a Hoboken, N.J. :
|b John Wiley & Sons :
|b IEEE Press,
|c c2006.
|
300 |
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|a 1 online resource (xvi, 498 p.) :
|b ill.
|
336 |
|
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|a text
|b txt
|2 rdacontent
|0 http://id.loc.gov/vocabulary/contentTypes/txt
|
337 |
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|a computer
|b c
|2 rdamedia
|0 http://id.loc.gov/vocabulary/mediaTypes/c
|
338 |
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|a online resource
|b cr
|2 rdacarrier
|0 http://id.loc.gov/vocabulary/carriers/cr
|
504 |
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|a Includes bibliographical references and index.
|
505 |
0 |
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|a Fundamentals of contamination control -- Fundamentals of ESD control -- Sampling and analysis methods -- Facilities design : contamination- and ESD-safe work areas -- Getting clean parts and getting parts clean -- Tooling design and certification -- Continuous monitoring -- Consumable supplies and packaging materials -- Controlling contamination and ESD from people -- Layout of change rooms -- Procedures and documentation.
|
520 |
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|a "This book offers effective strategies and techniques for contamination and electrostatic discharge (ESD) control that can be implemented in a wide range of high-technology industries, including semiconductor, disk drive, aerospace, pharmaceutical, medical device, automobile, and food production manufacturing. The authors set forth a new and innovative methodology that can manage both contamination and ESD, often considered to be mutually exclusive challenges requiring distinct strategies." "Contamination and ESD Control in High-Technology Manufacturing conveys a practical, working knowledge of contamination and ESD control strategies and techniques, and it is filled with case studies that illustrate key principles and the benefits of contamination and ESD control. Moreover, its straightforward style makes the material, which integrates many disciplines of engineering and science, clear and accessible."--Jacket.
|
650 |
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0 |
|a Electronic apparatus and appliances
|x Protection.
|0 http://id.loc.gov/authorities/subjects/sh85042265
|
650 |
|
0 |
|a Electric discharges.
|0 http://id.loc.gov/authorities/subjects/sh85041655
|
650 |
|
0 |
|a Electrostatics.
|0 http://id.loc.gov/authorities/subjects/sh85042463
|
650 |
|
0 |
|a Contamination (Technology)
|0 http://id.loc.gov/authorities/subjects/sh85031524
|
650 |
|
0 |
|a Clean rooms.
|0 http://id.loc.gov/authorities/subjects/sh85026887
|
650 |
|
7 |
|a Electronic apparatus and appliances
|x Protection.
|2 fast
|0 http://id.worldcat.org/fast/fst00906823
|
650 |
|
7 |
|a Electric discharges.
|2 fast
|0 http://id.worldcat.org/fast/fst00904680
|
650 |
|
7 |
|a Electrostatics.
|2 fast
|0 http://id.worldcat.org/fast/fst00907767
|
650 |
|
7 |
|a Contamination (Technology)
|2 fast
|0 http://id.worldcat.org/fast/fst00876602
|
650 |
|
7 |
|a Clean rooms.
|2 fast
|0 http://id.worldcat.org/fast/fst00863889
|
700 |
1 |
|
|a Nagarajan, R.
|q (Ramamurthy)
|0 http://id.loc.gov/authorities/names/n2005086843
|1 http://viaf.org/viaf/65884591
|
700 |
1 |
|
|a Newberg, Carl E.
|0 http://id.loc.gov/authorities/names/n2005086846
|1 http://viaf.org/viaf/78193156
|
710 |
2 |
|
|a John Wiley & Sons.
|0 http://id.loc.gov/authorities/names/n80083764
|1 http://viaf.org/viaf/132228666
|
776 |
0 |
8 |
|i Print version:
|a Welker, R. W.
|t Contamination and ESD control in high technology manufacturing.
|d Hoboken, N.J. : John Wiley & Sons : IEEE Press, c2006
|z 0471414522
|w (DLC) 2005058119
|w (OCoLC)62421366
|
856 |
4 |
0 |
|3 IEEE Xplore
|u http://ieeexplore.ieee.org/xpl/bkabstractplus.jsp?bkn=5201423
|
903 |
|
|
|a HeVa
|
929 |
|
|
|a eresource
|
999 |
f |
f |
|i c1033908-e43b-586f-8ea7-40294a95c817
|s 23a9cd6f-0d46-53bf-bb4c-7dfb1596bbf0
|
928 |
|
|
|t Library of Congress classification
|a TK7870 .W36 2006
|l Online
|c UC-FullText
|u http://ieeexplore.ieee.org/xpl/bkabstractplus.jsp?bkn=5201423
|m IEEE Xplore:
|g ebooks
|i 7600299
|